DI-UMONS : Dépôt institutionnel de l’université de Mons

Recherche transversale
(titres de publication, de périodique et noms de colloque inclus)
2008-11-18 - Article/Dans un journal avec peer-review - Anglais - 8 page(s)

VanOverschelde O., Guisbiers G., Hamadi F., Hemberg A., Snyders Rony , Wautelet Michel , "Alternative to classic annealing treatments for fractally patterned TiO2 thin films" in Journal of Applied Physics, 104, 10, 103106-103113

  • Edition : American Institute of Physics, Melville (NY)
  • Codes CREF : Résistance des matériaux (DI2112), Physique de l'état solide (DI1261), Chimie des solides (DI1316), Physique des plasmas (DI1233)
  • Unités de recherche UMONS : Chimie des interactions plasma-surface (S882)
  • Instituts UMONS : Institut de Recherche en Science et Ingénierie des Matériaux (Matériaux)
Texte intégral :

Abstract(s) :

(Anglais) Titanium dioxide thin films have been deposited by reactive magnetron sputtering on glass and subsequently irradiated by UV radiation using a KrF excimer laser. The influence of the laser fluence (F) on the constitution and microstructure of the deposited films is studied for 0.05<F<0.40 J/cm2. The diffraction data reveal that as deposited films are amorphous, while irradiated films present an anatase structure. Additional Raman spectroscopy study shows better crystal quality for the films irradiated with F<0.13 J/cm2. The film morphology appears to be strongly modified after laser treatment. Atomic force microscopy and scanning electron microscopy measurements reveal fractally textured films presenting characteristics of high porosity and high specific surface area. Finally, contact angle analysis suggests hydrophobic or wetting behavior depending on F. In order to explain the laser-induced structuration mechanisms, we have successfully applied a fractal as well as the nucleation theories. We propose that electronics effects could be responsible for the observed crystallization.

Identifiants :
  • DOI : 10.1063/1.3021161
  • ISSN : 0021-8979