DI-UMONS : Dépôt institutionnel de l’université de Mons

Recherche transversale
(titres de publication, de périodique et noms de colloque inclus)
2021-06-14 - Colloque/Présentation - poster - Anglais - page(s)

Leonova Kseniia , Britun Nikolay , Konstantinidis Stéphanos , "Magnetron Sputtering with a Hot Niobium Target" in 9th symposium on Functional Coatings and Surface Engineering FCSE-2021, Montreal (online), Canada (online), 2021

  • Codes CREF : Chimie des surfaces et des interfaces (DI1327)
  • Unités de recherche UMONS : Chimie des interactions plasma-surface (S882)
  • Instituts UMONS : Institut de Recherche en Science et Ingénierie des Matériaux (Matériaux)
  • Centres UMONS : Centre d’Innovation et de Recherche en Matériaux Polymères (CIRMAP)
Texte intégral :

Abstract(s) :

(Anglais) Hot Magnetron Sputtering (HMS), a technique that uses a non-cooled target, allows increasing the film deposition rate in comparison with “traditional” Cold Magnetron Sputtering (CMS) when the sputtered target is cooled during the process and the applied power density is limited. Enhancement of the deposition rate allows improving the production rate, particularly, when the films should be uniformly deposited onto moving samples, e.g. powders. In the present study, the applied power density was increased up to 37 W/cm2 during HMS and the deposition rate of about 0.1 µm/min is achieved. Time-resolved optical emission spectroscopy allowed to monitor the target heating process along with the plasma composition, reflecting the increased number of emitted thermoelectrons in the HMS case. In addition, the structural changes in the deposited films were revealed based on their analysis via scanning electron microscopy.

Mots-clés :
  • (Anglais) niobium
  • (Anglais) hot target
  • (Anglais) deposition rate
  • (Anglais) OES
  • (Anglais) magnetron sputtering