DI-UMONS : Dépôt institutionnel de l’université de Mons

Recherche transversale
(titres de publication, de périodique et noms de colloque inclus)
2013-09-09 - Colloque/Présentation - communication orale - Anglais - 21 page(s)

Aparicio Rebollo Francisco , Thiry Damien , Snyders Rony , "Towards the understanding of the influence of the substrate temperature on the sulfur content of propanethiol plasma polymers films" in EUROMAT 2013, Seville, Spain, 2013

  • Codes CREF : Chimie des surfaces et des interfaces (DI1327), Chimie des polymères de synthèse (DI131C), Physique des plasmas (DI1233)
  • Unités de recherche UMONS : Chimie des interactions plasma-surface (S882)
  • Instituts UMONS : Institut de Recherche en Science et Ingénierie des Matériaux (Matériaux)
  • Centres UMONS : Centre d’Innovation et de Recherche en Matériaux Polymères (CIRMAP)

Abstract(s) :

(Anglais) Plasma polymerization of sulfur-based molecules such as propanethiol is an efficient method to grow thiol (-SH) supporting surfaces that can serve, for examples, as nucleation centers for gold nanoparticles or for the immobilization of DNA molecules. Recently, we have observed the presence in such plasma polymer films (ppf) of H2S or/and CS2 molecules trapped in the plasma polymer film (ppf) network [1]. These embedded molecules could be released during the use of the support which could lead to undesirable effects. In this work, we aim to get more understanding on this phenomenon in order to control and, ultimately, limit it. For a given set of deposition conditions, the evolution of the sulfur content (%at. S) in the ppf was evaluated by XPS as a function of the deposition duration (tdep.). The data reveal a decrease of %at. S (~ 10%) with tdep. suggesting a lowering of the trapping phenomenon. This behavior was explained by considering the increase in the interface temperature as a function of tdep. (from 25°C to 95°C) which would limit the adsorption of H2S and/or CS2 during the ppf growth. Depositions at short tdep. on heated substrate (T = 95°C) and at long tdep. while keeping constant the substrate temperature at 30°C support this explanation. As a complementary and supporting element, XPS depth profiles (using a C60 + gun) allow highlighting the role of the interface temperature in the generation of a %at.S gradient through the ppf thickness. On the contrary, homogeneous %at.S through the ppf thickness is revealed when the interface temperature is kept constant during the deposition. The whole set of our data clearly demonstrate that the substrate temperature plays a key role in determining the thiol-based plasma polymer films chemistry. [1] Thiry, D.; Britun, N.; Konstantinidis, S.; Dauchot, J.-P.; Denis, L.; Snyders, R. Appl. Phys. Lett. 2012, 100, 071604.