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2013-08-04 - Colloque/Présentation - communication orale - Anglais - 1 page(s)

Thiry Damien , Guillaume Maxime, Cornil Jérôme , Snyders Rony , "Towards the understanding of the influence of the substrate temperature on the chemical composition of propanethiol plasma polymers films" in 21st International Symposium on Plasma Chemistry, Cairns , Australia, 2013

  • Codes CREF : Chimie des surfaces et des interfaces (DI1327)
  • Unités de recherche UMONS : Chimie des interactions plasma-surface (S882)
  • Instituts UMONS : Institut de Recherche en Science et Ingénierie des Matériaux (Matériaux)
  • Centres UMONS : Centre d’Innovation et de Recherche en Matériaux Polymères (CIRMAP)

Abstract(s) :

(Anglais) Plasma polymerization of sulfur-based molecules such as propanethiol is a potentially good method to grow thiol (-SH) supporting surfaces that can serve as nucleation centers for gold nanoparticles or for the immobilization of DNA molecules. Recently, we have observed the presence in such plasma polymer films (ppf) of H2S or/and CS2 molecules trapped in the ppf network [1]. These molecules embedded in the ppf could be released during the use of the support which could lead to undesirable effects. In this work, the aim is to get more understanding on this effect in order to limit it. For a given set of deposition conditions, the evolution of the sulfur content (%at. S) in the ppf was evaluated by XPS as a function of the deposition duration (tdep). The data reveal a decrease of the %at. S (~ 10%) with tdep suggesting a lowering of the trapping phenomenon. This behavior was explained by considering the increase in the interface temperature (From 25°C to 95°C) as a function of tdep which would limit the adsorption of H2S and/or CS2 during the ppf growth. Depositions at short tdep on heated substrate as well as at long tdep on cooled substrate support our explanation. In addition, based on XPS depth profiles using C60+ gun, the influence of the interface temperature variation on the sulfur homogeneity over the thickness layer is clearly highlighted. On the other hand, homogeneous sulfur content was found when the interface temperature was kept constant during the deposition. The whole set of our data clearly demonstrate that the substrate temperature plays a key role for the growth of thiol-based plasma polymer films. [1] Thiry, D.; Britun, N.; Konstantinidis, S.; Dauchot, J.-P.; Denis, L.; Snyders, R. Appl. Phys. Lett. 2012, 100, 071604.