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2008-08-01 - Article/Dans un journal avec peer-review - Anglais - 5 page(s)

Felten Alexandre, Ghijsen J., Pireaux Jean-Jacques, Johnson R-L., Liang D., Van Tendeloo Gustaaf, Bittencourt Carla , "Photoemission Study of CF4 rf-plasma Treated Multi-wall Carbon Nanotubes" in Carbon, 46, 10, 1271-1275

  • Edition : Elsevier Science, Oxford (United Kingdom)
  • Codes CREF : Chimie des solides (DI1316), Physique des plasmas (DI1233)
  • Unités de recherche UMONS : Chimie des interactions plasma-surface (S882)
  • Instituts UMONS : Institut de Recherche en Science et Ingénierie des Matériaux (Matériaux)
Texte intégral :

Abstract(s) :

(Anglais) Multi-wall carbon nanotubes (MWCNTs) were exposed to a CF4 rf-plasma. X-ray photoelectron spectroscopy analysis shows that the treatment effectively grafts fluorine atoms onto the MWCNTs. The fluorine atomic concentration and the nature of the C–F bond (semi-ionic or covalent) can be tuned by varying the exposure time. Ultraviolet photoelectron spectroscopy analysis confirms that the valence electronic states are altered by the grafting of fluorine atoms. Characterization with high-resolution transmission electron microscopy reveals that while the plasma treatment does not induce significant etching impact on the CNT-surface, it does increase the number of active sites for gold cluster formation.

Identifiants :
  • DOI : 10.1016/j.carbon.2008.04.027