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2007-07-31 - Article/Dans un journal avec peer-review - Anglais - 5 page(s)

Van Overschelde Olivier , Guisbiers G., Wautelet Michel , "Micro-structuring of TiO2 thin films by laser-assisted diffraction processing" in Applied Surface Science, 253, Issue 19, 7890-7894

  • Edition : Elsevier Science, Amsterdam (The Netherlands)
  • Codes CREF : Résistance des matériaux (DI2112), Physique de l'état solide (DI1261), Chimie des solides (DI1316), Physique des plasmas (DI1233)
  • Unités de recherche UMONS : Physique expérimentale et biologique (M104), Chimie des interactions plasma-surface (S882)
  • Instituts UMONS : Institut de Recherche en Science et Ingénierie des Matériaux (Matériaux)
Texte intégral :

Abstract(s) :

(Anglais) Thin films of TiO2 are deposited by magnetron sputtering on glass substrate and are irradiated by UV radiation using a KrF excimer laser (248 nm). These thin films are patterned with a razor blade placed on the way of the radiation just in front of the TiO2 thin film. Just near the edge of the razor blade on the thin film, diffraction lines are observed, resulting in the ablation of the film. These patterns are characterized by optical microscopy, mechanical profilometry. Diffraction up to the 35th order is observed. The results are shown to be compatible with a model in which electronic excitation plays the major role.

Identifiants :
  • DOI : 10.1016/j.apsusc.2007.02.072
  • ISSN : 0169-4332