DI-UMONS : Dépôt institutionnel de l’université de Mons

Recherche transversale
Rechercher
(titres de publication, de périodique et noms de colloque inclus)
2006-04-30 - Article/Dans un journal avec peer-review - Anglais - 6 page(s)

Van Overschelde Olivier , Dinu S., Guisbiers G., Monteverde F., Nouvellon C., Wautelet Michel , "Excimer laser ablation of thin titanium oxide films on glass" in Applied Surface Science, 252, Issue 13, 4722-4727

  • Edition : Elsevier Science, Amsterdam (The Netherlands)
  • Codes CREF : Résistance des matériaux (DI2112), Physique de l'état solide (DI1261), Chimie des solides (DI1316), Physique des plasmas (DI1233)
  • Unités de recherche UMONS : Physique expérimentale et biologique (M104), Chimie des interactions plasma-surface (S882)
  • Instituts UMONS : Institut de Recherche en Science et Ingénierie des Matériaux (Matériaux)
Texte intégral :

Abstract(s) :

(Anglais) Thin titanium dioxide films are deposited on glass substrates by magnetron sputter deposition. They are irradiated in air, by means of a KrF excimer laser. The ablation rate is measured as a function of the laser fluence per pulse, F, and of the number of pulses, N. Above a fluence threshold, the films are partially ablated. The ablated thickness does not vary linearly with N. This is the signature of a negative feedback between the film thickness and the ablation rate. The origin of this negative feedback is shown to be due to either thermal or electronic effects, or both. At high F, the film detachs from the substrate.

Identifiants :
  • ISSN : 0169-4332
  • DOI : 10.1016/j.apsusc.2005.07.147